Optical materials is a mature, but still an actively developing field today. Miniaturisation and integration of the optical devices impose new challenges shaping the right material into the right form is not always an easy task. This issue we address in our lab, where we develop methods of fabrication and processing of optical materials for integrated optics.
High vacuum chemical vapour deposition technique has been developed during many years in our group for deposition of thin films of oxide materials. Our HVCVD reactor is designed for 4 wafers, healable up to 700°C. Three independent precursor delivery lines are available on the reactor. Precursor behaviour in high vacuum may significantly differ from the observed in standard CVD conditions. Our expertise and research interest include the important part of precursor testing and selection.
Both crystalline, functional (e.g. electro-optic) materials, doping for active laser properties and amorphous films for passive waveguiding functionality have been deposited our the past years. List of materials, which we have been or are working with, includes, but is not limited to LiNbO3, BaTiO3, TiO2, Al2O3, Nb2O3, HfO2,
Characterization of the thin films structural and functional properties is also an important task in the investigations and provides feedback for the fabrication process.
Currently, we are working on the integration of the crystalline materials such as LiNbO3 and BaTiO3 on technological substrates to enable up scaling. Processing methods of thin films on the wafer scale, such as structuring, selective deposition with irradiation by laser or electron beam, lift-off techniques, are critical aspects of integration and device fabrication and also receive high attention in our research.
Contact: Patrik Hoffmann & Yury Kuzminykh